Plasma wafer etching machine - M-8000 series - Hitachi High-Tech Europe GmbH - for the microelectronics industry

Conductor Etch System M-8000 Series is utilized for hard mask and silicon etching for 32nm and beyond. Hitachi High-Tech developed new process flows, such as double patterning and new material etch processes such as high-k dielectric/metal gate through JDP (Joint Development Program) with device
Conductor Etch System M-8000 Series is utilized for hard mask and silicon etching for 32nm and beyond. Hitachi High-Tech developed new process flows, such as double patterning and new material etch processes such as high-k dielectric/metal gate

Microwave Plasma Photoresist Ashing - PVA TePla America, LLC

Large silicon wafer etching machine - Emphysys Technology Solutions

Technology Trends—Fourth Quarter 1986

Semiconductor Device Manufacturing & Inspection Equipment : Products : Hitachi Review

7. Etch System - What is an Etch System? : Hitachi High-Tech Corporation

Semiconductor Manufacturing & Inspection Equipment : Electronic Systems & Equipment : Hitachi Review

Plasma Etch Equipment

EMCP plasma engraving system - E-6000 series - Hitachi High-Tech Europe GmbH - for non-volatile materials

Reactive Ion Etching Tool and Wafer Etching – Cleanroom Research Laboratory

Fabrication and evaluation of aluminum nitride based MEMS piezoelectric vibration sensors for large-amplitude vibration applications

Plasma Cleaning and Etchers, Plasma Clean